LaBrake, Dwayne L.: шукати на сайті Z-Library

Пожертвування 15 вересня 2024 – 1 жовтня 2024 Про збір коштів

Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

Також БЕЗЛІМТНІ завантаження (протягом 31 дня після завершення пожертвування) доступні для ВСІХ користувачів, які підтримають проект в період збору коштів до 1 жовтня 2024.

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Книги
Статті (37)
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1

Defect reduction for semiconductor memory applications using jet and flash imprint lithography

Ye, Zhengmao, Luo, Kang, Lu, Xiaoming, Fletcher, Brian, Liu, Weijun, Xu, Frank, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.

Журнал:

Journal of Micro/Nanolithography MEMS and MOEMS

Рік:

2012

Мова:

english

Файл:

PDF, 2.51 MB

english, 2012

2

Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography

Cherala, Anshuman, Schumaker, Philip, Mokaberi, Babak, Selinidis, Kosta, Choi, Byung Jin, Meissl, Mario J., Khusnatdinov, Niyaz N., LaBrake, Dwayne, Sreenivasan, S. V.

Журнал:

IEEE/ASME Transactions on Mechatronics

Рік:

2015

Мова:

english

Файл:

PDF, 1.13 MB

english, 2015

3

Step and flash imprint lithography for manufacturing patterned media

Schmid, Gerard M., Miller, Mike, Brooks, Cynthia, Khusnatdinov, Niyaz, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V., Gauzner, Gene, Lee, Kim, Kuo, David, Weller, Dieter, Yang, XiaoMin

Журнал:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Рік:

2009

Мова:

english

Файл:

PDF, 1.85 MB

english, 2009

4

Minimizing linewidth roughness in Step and Flash Imprint Lithography

Niyaz Khusnatdinov, Gerard M. Schmid, Cynthia B. Brooks, Dwayne LaBrake, Douglas J. Resnick, Mark W. Hart, Kailash Gopalakrishnan, Rohit Shenoy, Ron Jih, Ying Zhang, Edmund Sikorski, Mary Beth Rothwel

Журнал:

Microelectronic Engineering

Рік:

2008

Мова:

english

Файл:

PDF, 657 KB

english, 2008

5

Imprint lithography advances in LED manufacturing

Robert Hershey, Gary Doyle, Chris Jones, Dwayne LaBrake, Mike Miller

Журнал:

physica status solidi (c)

Рік:

2007

Мова:

english

Файл:

PDF, 209 KB

english, 2007

6

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Step and flash imprint lithography template fabrication for emerging market applications

Resnick, Douglas J., Schmid, Gerard, Miller, Mike, Doyle, Gary, Jones, Chris, LaBrake, Dwayne, Watanabe, Hidehiro

Рік:

2007

Мова:

english

Файл:

PDF, 1.98 MB

english, 2007

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - High-density patterned media fabrication using jet and flash imprint lithography

Ye, Zhengmao, Herr, Daniel J. C., Ramos, Rick, Brooks, Cynthia, Simpson, Logan, Fretwell, John, Carden, Scott, Hellebrekers, Paul, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.

Рік:

2011

Мова:

english

Файл:

PDF, 2.67 MB

english, 2011

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Defect reduction of high-density full-field patterns in jet and flash imprint lithography

Singh, Lovejeet, Herr, Daniel J. C., Luo, Kang, Ye, Zhengmao, Xu, Frank, Haase, Gaddi, Curran, David, LaBrake, Dwayne, Resnick, Douglas, Sreenivasan, S. V.

Рік:

2011

Мова:

english

Файл:

PDF, 1.24 MB

english, 2011

9

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Controlling linewidth roughness in step and flash imprint lithography

Schmid, Gerard M., Khusnatdinov, Niyaz, Brooks, Cynthia B., LaBrake, Dwayne, Thompson, Ecron, Resnick, Douglas J., Owens, Jordan, Ford, Arnie, Sasaki, Shiho, Toyama, Nobuhito, Kurihara, Masaaki, Hayas

Рік:

2008

Мова:

english

Файл:

PDF, 698 KB

english, 2008

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - High volume jet and flash imprint lithography for discrete track patterned media

Ye, Zhengmao, Herr, Daniel J. C., Ramos, Rick, Brooks, Cynthia B., Hellebrekers, Paul, Carden, Scott, LaBrake, Dwayne

Рік:

2010

Мова:

english

Файл:

PDF, 3.63 MB

english, 2010

11

Observing Crystallization Molecule-by-Molecule Using Exciton Transfer/Emission Spectroscopy

Graham, Daniel J., LaBrake, Dwayne L.

Журнал:

Applied Spectroscopy

Рік:

1993

Мова:

english

Файл:

PDF, 304 KB

english, 1993

12

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Jet and flash imprint lithography for the fabrication of patterned media drives

Schmid, Gerard M., Brooks, Cynthia, Ye, Zhengmao, Johnson, Steve, LaBrake, Dwayne, Sreenivasan, S. V., Resnick, Douglas J., Zurbrick, Larry S., Montgomery, M. Warren

Рік:

2009

Мова:

english

Файл:

PDF, 4.97 MB

english, 2009

13

Molecular-level crystallization of benzophenone: low-temperature quench, annealing, and phosphorescence experiments

Graham, Daniel J., LaBrake, Dwayne L.

Журнал:

Journal of Physical Chemistry

Рік:

1993

Мова:

english

Файл:

PDF, 559 KB

english, 1993

14

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Nanoengineering: Fabrication, Properties, Optics, and Devices X - High volume nanoscale roll-based imprinting using jet and flash imprint lithography

Ahn, Se Hyun, Miller, Mike, Yang, Shuqiang, Ganapathisubramanian, Maha, Menezes, Marlon, Singh, Vik, Choi, Jin, Xu, Frank, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V., Campo, Eva M., Dobi

Рік:

2013

Мова:

english

Файл:

PDF, 4.70 MB

english, 2013

15

Photochemistry and reaction dynamics of HBr in xenon matrices: Photodissociation of HBr and production of Br atoms

LaBrake, Dwayne, Ryan, E. Todd, Weitz, Eric

Журнал:

The Journal of Chemical Physics

Рік:

1995

Мова:

english

Файл:

PDF, 468 KB

english, 1995

16

Defect analysis for patterned media

Ye, Zhengmao, Fretwell, John, Luo, Kang, Ha, Steven, Schmid, Gerard, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.

Журнал:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Рік:

2010

Мова:

english

Файл:

PDF, 671 KB

english, 2010

17

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning

Lentz, David, Doyle, Gary, Miller, Mike, Schmidt, Gerald, Ganapathisuramanian, Maha, Lu, Xiaoming, Resnick, Doug, LaBrake, Dwayne L., Lercel, Michael J.

Рік:

2007

Мова:

english

Файл:

PDF, 2.07 MB

english, 2007

18

Template Fabrication Challenges for Patterned Media

Resnick, Douglas, Schmid, Gerard, Miller, Mike, Doyle, Gary, Jones, Chris, LaBrake, Dwayne

Журнал:

MRS Proceedings

Рік:

2006

Мова:

english

Файл:

PDF, 6.26 MB

english, 2006

19

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Development of template and mask replication using jet and flash imprint lithography

Brooks, Cynthia, Selinidis, Kosta, Doyle, Gary, Brown, Laura, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V., Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 11.14 MB

english, 2010

20

Effect of Deposition Temperature on the Mobility of Matrix-Isolated Species: HBr in Xenon

Fairbrother, D. Howard, LaBrake, Dwayne, Weitz, Eric

Журнал:

Journal of Physical Chemistry

Рік:

1996

Мова:

english

Файл:

PDF, 209 KB

english, 1996

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - High volume nanoscale roll-based imprinting using jet and flash imprint lithography

Resnick, Douglas J., Bencher, Christopher, Ahn, Se Hyun, Miller, Michael, Yang, Shuqiang, Ganapathisubramanian, Maha, Menezes, Marlon, Singh, Vik, Wan, Fen, Choi, Jin, Xu, Frank, LaBrake, Dwayne, Resn

Рік:

2014

Мова:

english

Файл:

PDF, 5.75 MB

english, 2014

22

Pulsed-laser heating studies of organic amorphous/glassy systems. 2. Experiments with benzophenone

Graham, Daniel J., LaBrake, Dwayne L.

Журнал:

Journal of Physical Chemistry

Рік:

1991

Мова:

english

Файл:

PDF, 490 KB

english, 1991

23

SPIE Proceedings [SPIE Photonics East '99 - Boston, MA (Sunday 19 September 1999)] Optical Devices for Fiber Communication - Photosensitivity and UV-induced optical loss of silica optical fibers exposed to very high pressure hydrogen environments

Brennan III, James F., Sloan, Diann A., May, Michael, LaBrake, Dwayne L., Digonnet, Michel J. F.

Рік:

1999

Мова:

english

Файл:

PDF, 220 KB

english, 1999

24

SPIE Proceedings [SPIE Integrated Optoelectronic Devices 2007 - San Jose, CA (Saturday 20 January 2007)] Light-Emitting Diodes: Research, Manufacturing, and Applications XI - Manufacturing implications for photonic crystal patterning using imprint lithography

Jones, Chris, Streubel, Klaus P., Jeon, Heonsu, Lentz, David, Doyle, Gary, Miller, Mike, Ganapathisubramanian, Maha, Lu, Xiaoming, Resnick, Doug, LaBrake, Dwayne L.

Рік:

2007

Мова:

english

Файл:

PDF, 2.01 MB

english, 2007

25

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Linewidth roughness characterization in step and flash imprint lithography

Schmid, Gerard M., Horiuchi, Toshiyuki, Khusnatdinov, Niyaz, Brooks, Cynthia B., LaBrake, Dwayne, Thompson, Ecron, Resnick, Douglas J.

Рік:

2008

Мова:

english

Файл:

PDF, 1.97 MB

english, 2008

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Imprint process performance for patterned media at densities greater than 1Tb/in2

Ye, Zhengmao, Carden, Scott, Hellebrekers, Paul, LaBrake, Dwayne, Resnick, Douglas J., Melliar-Smith, M., Sreenivasan, S. V., Tong, William M.

Рік:

2012

Мова:

english

Файл:

PDF, 3.12 MB

english, 2012

27

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Mask replication using jet and flash imprint lithography

Selinidis, Kosta S., Maurer, Wilhelm, Abboud, Frank E., Jones, Chris, Doyle, Gary F., Brown, Laura, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S. V.

Рік:

2011

Мова:

english

Файл:

PDF, 6.16 MB

english, 2011

28

SPIE Proceedings [SPIE MOEMS-MEMS 2008 Micro and Nanofabrication - San Jose, CA (Saturday 19 January 2008)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics - Step and flash imprint process integration techniques for photonic crystal patterning: template replication through wafer patterning irrespective of tone

Miller, Mike, Suleski, Thomas J., Schoenfeld, Winston V., Brooks, Cindy, Lentz, David, Wang, Jian J., Doyle, Gary, Resnick, Doug, LaBrake, Dwayne

Рік:

2008

Мова:

english

Файл:

PDF, 1.13 MB

english, 2008

29

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Defect reduction of patterned media templates and disks

Luo, Kang, Hosono, Kunihiro, Ha, Steven, Fretwell, John, Ramos, Rick, Ye, Zhengmao, Schmid, Gerard, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.

Рік:

2010

Мова:

english

Файл:

PDF, 4.66 MB

english, 2010

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Step and flash imprint lithography for manufacturing patterned media

Brooks, Cynthia, Schellenberg, Frank M., La Fontaine, Bruno M., Schmid, Gerard M., Miller, Mike, Johnson, Steve, Khusnatdinov, Niyaz, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.

Рік:

2009

Мова:

english

Файл:

PDF, 4.94 MB

english, 2009

31

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Miller, Mike, Mackay, R. Scott, Doyle, Gary, Stacey, Nick, Xu, Frank, Sreenivasan, S. V., Watts, Mike, LaBrake, Dwayne L.

Рік:

2005

Мова:

english

Файл:

PDF, 491 KB

english, 2005

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Etching of 42-nm and 32-nm half-pitch features patterned using step and FlashÂ® imprint lithography

Brooks, Cynthia B., Schellenberg, Frank M., LaBrake, Dwayne L., Khusnatdinov, Niyaz

Рік:

2008

Мова:

english

Файл:

PDF, 1.19 MB

english, 2008

33

SPIE Proceedings [SPIE MOEMS-MEMS 2006 Micro and Nanofabrication - San Jose, CA (Saturday 21 January 2006)] Micromachining Technology for Micro-Optics and Nano-Optics IV - Fabrication of nano and micro optical elements by step and flash imprint lithography

Khusnatdinov, Niyaz, Johnson, Eric G., Nordin, Gregory P., Doyle, Gary, Miller, Mike, Suleski, Thomas J., Stacey, Nick, Watts, Mike, LaBrake, Dwayne L.

Рік:

2006

Мова:

english

Файл:

PDF, 552 KB

english, 2006

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Progress in mask replication using jet and flash imprint lithography

Selinidis, Kosta S., Herr, Daniel J. C., Brooks, Cynthia B., Doyle, Gary F., Brown, Laura, Jones, Chris, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S.V.

Рік:

2011

Мова:

english

Файл:

PDF, 8.07 MB

english, 2011

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography

Schmid, Gerard M., Schellenberg, Frank M., Khusnatdinov, Niyaz, Brooks, Cynthia B., LaBrake, Dwayne, Thompson, Ecron, Resnick, Douglas J.

Рік:

2008

Мова:

english

Файл:

PDF, 1.69 MB

english, 2008

36

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - 450mm wafer patterning with jet and flash imprint lithography

Thompson, Ecron, Hellebrekers, Paul, Hofemann, Paul, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S. V., Faure, Thomas B., Ackmann, Paul W.

Рік:

2013

Мова:

english

Файл:

PDF, 3.27 MB

english, 2013

37

Nanoimprint System for High Volume Semiconductor Manufacturing; Requirement for Resist Materials

Ito, Toshiki, Emoto, Keiji, Takashima, Tsuneo, Sakai, Keita, Liu, Weijun, DeYoung, James, Ye, Zhengmao, LaBrake, Dwayne

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2016

Мова:

english

Файл:

PDF, 4.43 MB

english, 2016